Four-chamber UHV unit for technological operations on a solid surface and surface analysis with adsorption, desorption, chemical reactions, effects of ion, electron and laser beams.
It includes:
- load chamber
- analytical chamber
- STM chamber
- chamber preparation.
It incorporates the electron spectrometer type OPC 103 "cylindrical mirror", a quadrupole mass spectrometer with mass range of QM17 1-300, three-grid low-energy electron diffractometer, a scanning tunneling microscope at room temperature of the sample GPI-300 piezoceramic natekateli gas CHA-1 , CHA-2, 2 ion cannons CI10, system of cooling and heating of the sample and the STM needle in the temperature range 110-1100 K.
Installation is combined with an optical spectrometer DFS-24 for the optical measurements (Raman scattering, photoluminescence) in situ.
The surface structure
STM (scanning tunneling microscopy). Allows to obtain images of the surface with atomic resolution and to carry out the spectral identification of the atoms in the temperature range 5-300 K.
LEED (Low Energy Electron Diffraction) The classic method for the determination of surface structure on the analysis of diffraction images. Used to characterize the structures on the surface of single crystals
EELFS (Extended Energy Loss Fine Structure). The method is based on an analysis of the extended fine structure in the spectra of electron loss caused by interference at the output of an electron from an atom of a solid. Allows you to define the local structure around the selected type of atoms.
Spectroscopy of the surface
AES (Auger Electron Spectroscopy). The standard measurement of the elemental composition of the surface. The use of factor analysis for the processing of the Auger spectra provides information about the chemical composition of the surface.
TDMS (Thermodesorption mass spectrometry). The classical method of studying surface chemical reactions. Allows you to determine the composition and energy termodesorbed compounds.
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